Radiation imaging apparatus

摘要

A radiation imaging apparatus according to the present invention includes a radiation source, a reflective structure where at least three reflective substrates are arranged with an interval and radiations being incident into a plurality of passages whose both sides are put between the reflective substrate are reflected and parallelized by the reflective substrate at both sides of the passage to be emitted from the passage, a radiation detector, and an image construction unit that constructs an image of an object based on an intensity of the radiation which is emitted from each of the passages, transmits the object and is detected by the radiation detector. When one edge of the reflective structure is an inlet of the radiation and the other edge is an outlet of the radiation, a pitch of the reflective substrates at the outlet is larger than a pitch at the inlet.

主权项

1. A radiation imaging apparatus, comprising:
a radiation source; a reflective structure in which
at least three reflective substrates are arranged with an interval, andradiation which is incident into a plurality of passages, both sides of each passage being put between the reflective substrate, is reflected and parallelized by the reflective substrate at both sides of the passage to be emitted from the passage; a radiation detector; and an image construction unit arranged to construct an image of an object based on an intensity of the radiation which is emitted from each of the passages, transmitted through the object, and is detected by the radiation detector, wherein when one edge of the reflective structure is an inlet of the radiation and the other edge is an outlet of the radiation, a pitch of the reflective substrates at the outlet is larger than a pitch of the reflective substrates at the inlet, wherein when a virtual plane is set in a position which is separated from the reflective substrates at both sides of the passage with the same distance, the radiation source is disposed on tangential planes of a plurality of virtual planes at the inlet and the tangential planes of the plurality of virtual planes at the outlet are approximately parallel to each other, and wherein if the interval between adjacent reflective substrates is constant and a thickness of the reflective substrate at an outlet side is larger than a thickness of the reflective substrate at an inlet side, a penumbra amount Δp of the object which is formed on the radiation detector satisfies the following relation:
Δp=L3×(s+g)/L1,  where L3 is a distance between the outlet and the radiation detector in the opposite direction, s is a size of the radiation source, g is an interval between adjacent reflective substrates, and L1 is a distance between the radiation source and the inlet in the opposite direction.