发明名称 Semiconductor device and manufacturing method and operating method for the same
摘要 A semiconductor device and a manufacturing method and an operating method for the same are provided. The semiconductor device comprises a substrate, a doped region and a stack structure. The doped region is in the substrate. The stack structure is on the substrate. The stack structure comprises a dielectric layer, an electrode layer, a solid electrolyte layer and an ion supplying layer.
申请公布号 US9019769(B2) 申请公布日期 2015.04.28
申请号 US201213710517 申请日期 2012.12.11
申请人 Macronix International Co., Ltd. 发明人 Lee Feng-Ming;Lin Yu-Yu;Lee Ming-Hsiu
分类号 G11C16/04;H01L29/788;H01L21/28 主分类号 G11C16/04
代理机构 McClure, Qualey & Rodack, LLP 代理人 McClure, Qualey & Rodack, LLP
主权项 1. A semiconductor device, comprising: a substrate; a doped region in the substrate; and a stack structure on the substrate, the stack structure comprising: a dielectric layer; an electrode layer; a solid electrolyte layer; and an ion supplying layer, wherein the electrode layer and the substrate are separated by the dielectric layer.
地址 Hsinchu TW