发明名称 |
Semiconductor device and manufacturing method and operating method for the same |
摘要 |
A semiconductor device and a manufacturing method and an operating method for the same are provided. The semiconductor device comprises a substrate, a doped region and a stack structure. The doped region is in the substrate. The stack structure is on the substrate. The stack structure comprises a dielectric layer, an electrode layer, a solid electrolyte layer and an ion supplying layer. |
申请公布号 |
US9019769(B2) |
申请公布日期 |
2015.04.28 |
申请号 |
US201213710517 |
申请日期 |
2012.12.11 |
申请人 |
Macronix International Co., Ltd. |
发明人 |
Lee Feng-Ming;Lin Yu-Yu;Lee Ming-Hsiu |
分类号 |
G11C16/04;H01L29/788;H01L21/28 |
主分类号 |
G11C16/04 |
代理机构 |
McClure, Qualey & Rodack, LLP |
代理人 |
McClure, Qualey & Rodack, LLP |
主权项 |
1. A semiconductor device, comprising:
a substrate; a doped region in the substrate; and a stack structure on the substrate, the stack structure comprising: a dielectric layer; an electrode layer; a solid electrolyte layer; and an ion supplying layer, wherein the electrode layer and the substrate are separated by the dielectric layer. |
地址 |
Hsinchu TW |