| 摘要 |
The present invention discloses a hybrid high voltage device and a manufacturing method thereof. The hybrid high voltage device is formed in a first conductive type substrate, and includes at least one lateral double diffused metal oxide semiconductor (LDMOS) device region and at least one vent device region, wherein the LDMOS device region and the vent device region are connected in a width direction and arranged in an alternating order. Besides, corresponding high voltage wells, sources, drains, body regions, and gates of the LDMOS device region and the vent device region are connected to each other respectively. |
| 主权项 |
1. A hybrid high voltage device formed in a first conductive type substrate, wherein the substrate has an upper surface, the hybrid high voltage device comprising:
at least one lateral double diffused metal oxide semiconductor (LDMOS) device region, which is formed in the substrate, wherein the LDMOS device region includes a first source, a first drain, a first body region, and a first gate; and at least one vent device region, which is formed in the substrate, wherein the vent device includes a second source, a second drain, a second body region, and a second gate, and wherein the vent device has a conduction resistance which is lower than a conduction resistance of the LDMOS device region; wherein the LDMOS device region and the vent device region are arranged in an alternating order in a width direction, and the first source, the first drain, the first body region, and the first gate are physically connected or electrically connected to the second source, the second drain, the second body region, and the second gate respectively. |
