Protective coatings resistant to reactive plasma processing

摘要

Embodiments of the invention relate to compositions of metal oxyfluoride-comprising glazes or metal fluoride-comprising glazes, glass ceramics, and combinations thereof which are useful as plasma-resistant solid substrates or plasma resistant protective coatings over other substrates. Also described are methods of fabricating various structures which incorporate such compositions, including solid substrates and coatings over the surface of a substrate which has a melting point which is higher than about 1600° C., such as aluminum oxide, aluminum nitride, quartz, silicon carbide, silicon nitride.

主权项

1. A method of forming a protective coating over a surface of a component used in a semiconductor plasma processing apparatus, said protective coating comprising a sintered composition including a yttrium-based oxyfluoride crystal phase, in combination with an oxyfluoride-comprising amorphous phase upon at least one surface of a substrate of said component, said method comprising:
a) applying a slurry comprising a powder in suspension over said at least one surface of said substrate, wherein said powder comprises yttrium fluoride, and said substrate is selected to have a melting point higher than about 1600° C.; and b) sintering said coating present on said substrate surface to produce a sintered coating comprising a yttrium-based oxyfluoride crystal phase, in combination with an oxyfluoride-comprising amorphous phase, where said oxyfluoride-comprising amorphous phase content ranges from about 4.5 molar % to about 22 molar % of said sintered coating composition, whereby said protective coating structure retards crack propagation through said coating; wherein said substrate is selected from the group consisting of aluminum oxide, aluminum nitride, quartz, silicon carbide, silicon nitride, or a combination thereof, wherein said sintering is carried out in an oxygen-containing environment, and wherein said powder comprises YF3 at a concentration ranging from about 80 weight % to about 90 weight % in combination with NdF3 at a concentration ranging from about 20% by weight to about 10% by weight, respectively.