| 摘要 |
According to an embodiment of the present invention, a substrate processing apparatus comprises: a chamber main body having a substrate transported through a passage formed on one side, and having opened upper part and lower part; an inner reaction tube providing a process space installed in the upper part of the chamber main body, and where a process for the substrate is carried out, and having an opened lower part; a substrate holder able to switch between a loading location where the substrate transported through the passage is loaded in a vertical direction, and a processing location where a process with regard to the substrate elevated toward the process space and loaded is carried out, as disposed in the opened lower part of the chamber; a blocking plate elevating with the substrate holder as connected to a lower part of the substrate holder, and closing the opened lower part of the inner reaction tube in the processing location; a connection cylinder elevating with the blocking plate as installed upright in a lower part of the blocking plate; and a blocking member connected between an opened lower surface of the chamber main body and the connection cylinder, and isolating the opened lower part of the chamber main body from the outside. |
