发明名称 Interference projection exposure system and method of using same
摘要 An exemplary embodiment of the present invention provides an interference projection exposure system comprising a beam-providing subsystem and an objective lens subsystem that can provide a plurality of light beams which intersect and interfere at an image plane to produce a high spatial frequency periodic optical-intensity distribution. The interference projection system can further comprise a pattern mask that can alter the periodic optical-intensity distribution so as to incorporate functional elements within the periodic optical-intensity distribution. The beam providing subsystem can comprise a beam generating subsystem, a beam conditioning subsystem and a beam directing subsystem. Another exemplary embodiment of the present invention provides for a method of producing a high spatial frequency periodic optical-intensity distribution using a interference projection exposure system.
申请公布号 US9019468(B2) 申请公布日期 2015.04.28
申请号 US201113249841 申请日期 2011.09.30
申请人 Georgia Tech Research Corporation 发明人 Burrow Guy Matthew;Gaylord Thomas K.
分类号 G02B27/10;G03F7/20 主分类号 G02B27/10
代理机构 Troutman Sanders LLP 代理人 Troutman Sanders LLP ;Schneider Ryan A.;Glass Christopher W.
主权项 1. An interference projection exposure system comprising: a beam-providing subsystem configured to provide a plurality of light beams; and an objective lens subsystem comprising an object plane, an objective lens and an image plane, the objective lens subsystem configured to receive the plurality of light beams from the beam-providing subsystem such that the plurality of beams intersect and interfere at the image plane to produce a periodic optical-intensity distribution, wherein the plurality of light beams intersect at the object plane of the objective lens subsystem between the beam-providing subsystem and the objective lens; wherein the beam-providing subsystem comprises: a beam-generating subsystem configured to generate the plurality of light beams,a beam-conditioning subsystem comprising a plurality of beam-conditioners and configured to receive the plurality of light beams from the beam-generating subsystem, anda beam-directing subsystem comprising a plurality of beam-directing elements and configured to receive the plurality of light beams from the beam-generating subsystem and direct the plurality of light beams to intersect at the object plane of the objective lens subsystem.
地址 Atlanta GA US