发明名称 Array substrate for liquid crystal display and method for manufacturing the same
摘要 An array substrate for a liquid crystal display includes a substrate and first and second subpixels which are positioned on the substrate and are defined by a crossing structure of one gate line, a first data line, a second data line, a first common line, and a second common line. The first subpixel includes a first semiconductor layer, a first source electrode, a first drain electrode, and a first pixel electrode connected to the first drain electrode. The second subpixel includes a second semiconductor layer, a second source electrode, a second drain electrode, and a second pixel electrode connected to the second drain electrode. The first and second subpixels share the one gate line with each other, and the first drain electrode and the second drain electrode are exposed through one contact hole.
申请公布号 US9018038(B2) 申请公布日期 2015.04.28
申请号 US201414520846 申请日期 2014.10.22
申请人 LG Display Co., Ltd. 发明人 Kim Kangil;Jang Sungyong;Lee Cheolhwan
分类号 H01L21/3213;H01L27/12;H01L29/66;H01L29/786;G02F1/1343;G02F1/1362;H01L21/02 主分类号 H01L21/3213
代理机构 Brinks Gilson & Lione 代理人 Brinks Gilson & Lione
主权项 1. A method for manufacturing an array substrate for a liquid crystal display comprising: forming a common gate line on a substrate; forming a gate insulating layer on the common gate line; forming a first semiconductor layer and a second semiconductor layer on the gate insulating layer; forming a first source electrode on the first semiconductor layer, forming a second source electrode on the second semiconductor layer, and forming a metal pattern between the first semiconductor layer and the second semiconductor layer; forming an organic insulating layer on the substrate after the metal pattern is formed, and forming a common contact hole above the common gate line and the metal pattern such that the metal pattern is exposed via the common contact hole; forming a transparent conductive material on the organic insulating layer and the metal pattern exposed through the common contact hole and patterning the transparent conductive material to form a first pixel electrode and a second pixel electrode; and patterning the metal pattern to form a first drain electrode connected to the first semiconductor layer and a second drain electrode connected to the second semiconductor layer.
地址 Seoul KR