Showerhead electrode assembly in a capacitively coupled plasma processing apparatus

摘要

A showerhead electrode assembly for use in a capacitively coupled plasma processing apparatus comprising a heat transfer plate. The heat transfer plate having independently controllable gas volumes which may be pressurized to locally control thermal conductance between a heater member and a cooling member such that uniform temperatures may be established on a plasma exposed surface of the showerhead electrode assembly.

主权项

1. A showerhead electrode assembly of a plasma processing chamber, comprising:
a showerhead electrode; a temperature controlled top plate configured to support the showerhead electrode; a heater plate disposed between the temperature controlled top plate and the showerhead electrode; and a heat transfer plate disposed between the showerhead electrode and the temperature controlled top plate, wherein the heat transfer plate comprises a plurality of independently controllable gas volumes which are fluidly isolated from others of the plurality of independently controllable gas volumes, such that a gas pressure within any given one of the plurality of independently controllable gas volumes does not affect another gas pressure within any other of the plurality of independently controllable gas volumes; wherein a heat transfer gas can be supplied or exhausted from each of the independently controllable gas volumes to achieve a predetermined gas pressure within each of the independently controllable gas volumes such that the thermal conductance across the heat transfer plate may be controlled.