X-ray optical apparatus

摘要

The present invention provides an X-ray optical apparatus including an X-ray reflective structure in which at least three reflective substrates are arranged with an interval and an X-ray which is incident into a plurality of X-ray passages whose both sides are put between the reflective substrates is reflected from the reflective substrate at both sides of the X-ray passage to be parallelized and emitted from the X-ray passage. When an edge of the X-ray reflective structure is an inlet of the X-ray and the other edge is an outlet of the X-ray, a pitch of the reflective substrates at the outlet is larger than a pitch at the inlet. Therefore, it is possible to efficiently parallelize the incident X-ray to be emitted with a simple structure.

主权项

1. An X-ray optical apparatus, comprising:
an X-ray reflective structure in which at least three reflective substrates are laminated so as to match both edges with an interval and an X-ray which is incident into an X-ray passage formed by a space, both sides of the passage being put between the reflective substrates, is reflected from the reflective substrate at both sides of the X-ray passage and emitted from the X-ray passage, wherein the at least three reflective substrates are arranged to have a constant and equal thickness, and wherein when an edge of the X-ray reflective structure is an inlet of the X-ray and the other edge is an outlet of the X-ray, a pitch of the reflective substrates at the outlet is larger than a pitch at the inlet, and wherein spacers arranged to have different heights are disposed between the reflective substrates, so that the pitch of the reflective substrates at the outlet side is larger than the pitch at the inlet side.