| 主权项 |
1. A hard mask composition, comprising:
a solvent and an aromatic ring-containing compound represented by the following Chemical Formula 1: wherein, in Chemical Formula 1, A is a substituted or unsubstituted aromatic cyclic group, R1 to R6 are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C3 to C30 cycloalkenyl group, a substituted or unsubstituted C7 to C20 an arylalkyl group, a substituted or unsubstituted C1 to C20 heteroalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkyl group, a substituted or unsubstituted C2 to C30 heteroaryl group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C2 to C30 alkynyl group, a substituted or unsubstituted C1 to C30 alkoxy group, or a combination thereof, X1 to X6 are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C1 to C30 alkoxy group, a substituted or unsubstituted C1 to C20 alkylamine group, an amino group, a hydroxy group, or a combination thereof, n1 to n6 are each independently 0 or 1, and 1≦n1+n2+n3+n4+n5+n6≦6. |
