发明名称 Methods and systems for gate dimension control in multi-gate structures for semiconductor devices
摘要 Methods and systems are disclosed for gate dimension control in multi-gate structures for integrated circuit devices. Processing steps for formation of one or more subsequent gate structures are adjusted based upon dimensions determined for one or more previously formed gate structures. In this way, one or more features of the resulting multi-gate structures can be controlled with greater accuracy, and variations between a plurality of multi-gate structures can be reduced. Example multi-gate features and/or dimensions that can be controlled include overall gate length, overlap of gate structures, and/or any other desired features and/or dimensions of the multi-gate structures. Example multi-gate structures include multi-gate NVM (non-volatile memory) cells for NVM systems, such as for example, split-gate NVM cells having select gates (SGs) and control gates (CGs).
申请公布号 US9018694(B2) 申请公布日期 2015.04.28
申请号 US201414302839 申请日期 2014.06.12
申请人 Freescale Semiconductor, Inc. 发明人 Kang Sung-Taeg;Du ShanShan
分类号 H01L29/792;H01L27/115;H01L21/8234;H01L29/423;H01L29/66;H01L29/788 主分类号 H01L29/792
代理机构 Egan, Peterman & Enders LLP. 代理人 Egan, Peterman & Enders LLP.
主权项 1. An integrated circuit device having a plurality of multi-gate structures, comprising: a plurality of first gates for a plurality of multi-gate structures for an integrated circuit device; and a plurality of second gates for the plurality of multi-gate structures; wherein the plurality of multi-gate structures comprise at least one hundred or more multi-gate structures; wherein overall gate lengths for the plurality of multi-gate structures vary by 10 percent or less; wherein the multi-gate structures comprise multi-gate structures for multi-gate non-volatile memory (NVM) cells; wherein the multi-gate NVM cells comprise split-gate NVM cells and each of the multi-gate structures comprises a select gate and a control gate; wherein the overall gate lengths comprise combined gate lengths for the select gates and the control gates without including any gate overlaps; wherein the overall gate length of the select gate and the control gate for each NVM cell is 280 to 320 nanometers; and wherein an overlap of the control gate and the select gate for each NVM cell is 40 to 60 nanometers.
地址 Austin TX US