Exposure method, substrate stage, exposure apparatus, and device manufacturing method

摘要

An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

主权项

1. An exposure apparatus that exposes a substrate through a projection optical system and an immersion region formed with a liquid below the projection optical system, the exposure apparatus comprising:
a stage that holds the substrate and that is movable relative to the projection optical system, wherein the stage includes: a supporting portion that supports an underside surface of the substrate; a first peripheral wall that is disposed around the supporting portion so as to face the underside surface of the substrate supported by the supporting portion; a second peripheral wall that is disposed inside the first peripheral wall such that the supporting portion is included within a first space surrounded by the second peripheral wall; and a first flow channel connected to a second space outside the first peripheral wall such that a liquid within the second space is recovered via the first flow channel.