| 发明名称 | Methods of forming molybdenum sputtering targets | ||
| 摘要 | In various embodiments, planar sputtering targets are produced by forming a billet at least by pressing molybdenum powder in a mold and sintering the pressed powder, working the billet to form a worked billet, heat treating the worked billet, working the worked billet to form a final billet, and heat treating the final billet. | ||
| 申请公布号 | US9017600(B2) | 申请公布日期 | 2015.04.28 |
| 申请号 | US201313849918 | 申请日期 | 2013.03.25 |
| 申请人 | H.C. Starck Inc. | 发明人 | Lemon Brad;Hirt Joseph;Welling Timothy;Daily, III James G.;Meendering David;Rozak Gary;O'Grady Jerome;Kumar Prabhat;Miller Steven A.;Wu Rong-chein Richard;Schwartz David G. |
| 分类号 | B22F3/12;B22F3/24;B22F3/20;C22C27/04;C23C14/34;B22F3/16;C22C1/04 | 主分类号 | B22F3/12 |
| 代理机构 | Morgan, Lewis & Bockius LLP | 代理人 | Morgan, Lewis & Bockius LLP |
| 主权项 | 1. A method of making a planar sputtering target comprising: forming a billet having a diameter D0, the formation comprising pressing molybdenum powder in a mold and sintering the pressed powder; working the billet to form a worked billet having a diameter D2 smaller than D0; heat treating the worked billet; working the worked billet to form a final billet having a diameter Df larger than D2; and heat treating the final billet. | ||
| 地址 | Newton MA US | ||