Retaining ring monitoring and control of pressure

摘要

A load cup apparatus for transferring a substrate in a processing system includes a pedestal assembly having a substrate support, an actuator, and a controller. The actuator is configured to move the pedestal assembly into a loading position in contact with a retaining ring of a carrier head and to generate a retaining ring thickness signal based on a distance travelled by the pedestal assembly. The controller is configured to receive the retaining ring thickness signal from the actuator.

主权项

1. A load cup apparatus for transferring a substrate in a processing system, comprising:
a pedestal assembly having a substrate support configured to support a rim of the substrate, the pedestal assembly further comprising a top surface and a lip projecting upward from the top surface and configured to surround a retaining ring of a carrier head to receive the substrate, the top surface and the lip fixed to substrate support such that the top surface and the lip travel vertically with the substrate support; an actuator configured to move the pedestal assembly with the substrate support, top surface and lip moving together into a loading or unloading position such that the top surface of the pedestal assembly is in contact with a bottom surface of the retaining ring of the carrier head, the actuator configured to generate a retaining ring thickness signal based on a distance traveled by the pedestal assembly for the top surface of the pedestal assembly to contact the retaining ring while the substrate support remains vertically fixed relative to the top surface; and a controller configured to receive the retaining ring thickness signal from the actuator.