发明名称 Apparatus and method for manufacturing of thin film type solar cell
摘要 Disclosed is an apparatus and method for manufacturing a thin film type solar cell, which enables the enhancement of productivity, the apparatus for manufacturing a thin film type solar cell including a first electrode forming unit; a first separation part; an optoelectric conversion layer forming unit; a contact line forming unit; a printing unit; and an etching process unit, wherein the etching process unit removes the optoelectric conversion layer in a second separation part to expose the first electrode in the second separation part through a wet etching process.
申请公布号 US9018034(B2) 申请公布日期 2015.04.28
申请号 US201113227978 申请日期 2011.09.08
申请人 Jusung Engineering Co., Ltd. 发明人 Yang Cheol Hoon
分类号 H01L21/00;H01L31/18;H01L21/67;H01L21/677;H01L31/075;H01L31/076;H01L31/0463 主分类号 H01L21/00
代理机构 Central California IP Group, P.C. 代理人 Fortney Andrew D.;Central California IP Group, P.C.
主权项 1. A method of manufacturing a thin film type solar cell, the method comprising: a) forming a first electrode over a substrate; b) removing a certain region of the first electrode to form a first separation part; c) forming an optoelectric conversion layer over the substrate, the substrate further comprising the first electrode and the first separation part; d) removing a certain region of the optoelectric conversion layer on the first electrode to form a contact line; e) printing a plurality of second electrodes on the optoelectric conversion layer and in the contact line, the second electrodes being connected to the first electrode through the contact line, such that adjacent second electrodes are separated at certain intervals by a second separation part; and f) wet etching the optoelectric conversion layer in the second separation part using the plurality of second electrodes as a mask to expose the first electrode in the second separation part wherein wet etching the optoelectric conversion layer comprises: primarily cleaning the substrate in a primary cleaning unit;spraying a gas toward an outlet of the primary cleaning unit using a first air curtain adjacent to and outside of the primary cleaning unit;conveying the primarily cleaned substrate having the second electrodes thereon through a wet etching unit;spraying a gas toward an inlet of the wet etching unit using a second air curtain adjacent to and outside of the wet etching unit;spraying etching solution on the primarily cleaned substrate in the wet etching unit to wet etch the optoelectric conversion laver;secondarily cleaning the substrate on which the etching solution has been sprayed in a secondary cleaning unit; anddrying the secondarily cleaned substrate.
地址 KR