| 发明名称 | Apparatus and method for supporting a workpiece during processing | ||
| 摘要 | An apparatus for supporting a workpiece during processing of the workpiece is disclosed. The apparatus comprises: a chassis having a vacuum chamber that is connectable to a vacuum source; a supporting device rotatable relative to the chassis, the supporting device having a hollow compartment and a supporting surface for holding the workpiece; and at least one sealing device arranged between the chassis and the supporting device, to provide an air-tight seal between the chassis and the supporting device while allowing for rotation of the supporting device with respect to the chassis, so as to form a vacuum passage extending from the supporting surface of the supporting device through the hollow compartment of the supporting device and the vacuum chamber of the chassis to the vacuum source, to thereby hold the workpiece to the supporting surface of the supporting device during processing of the workpiece. | ||
| 申请公布号 | US9016675(B2) | 申请公布日期 | 2015.04.28 |
| 申请号 | US201213542785 | 申请日期 | 2012.07.06 |
| 申请人 | ASM Technology Singapore Pte Ltd | 发明人 | Cheng Chi Wah;Chow Lap Kei;Leung Chi Hang |
| 分类号 | B25B11/00;C23C16/00;C23F1/00;B24B7/00;B24B9/00;B28D5/00;H01L21/67;H01L21/687;H01L21/683 | 主分类号 | B25B11/00 |
| 代理机构 | Ostrolenk Faber LLP | 代理人 | Ostrolenk Faber LLP |
| 主权项 | 1. An apparatus for supporting a workpiece during processing of the workpiece, the apparatus comprising: a chassis having a vacuum chamber that is connectable to a vacuum source; a supporting device rotatable relative to the chassis, the supporting device having a hollow compartment and a supporting surface for holding the workpiece; and at least one sealing device arranged between the chassis and the supporting device, to provide an air-tight seal between the chassis and the supporting device while allowing for rotation of the supporting device with respect to the chassis, so as to form a vacuum passage extending from the supporting surface of the supporting device through the hollow compartment of the supporting device and the vacuum chamber of the chassis to the vacuum source, to thereby hold the workpiece to the supporting surface of the supporting device during processing of the workpiece, wherein the at least one sealing device comprises: a polymeric material; and a biasing device arranged relative to the polymeric material to urge the polymeric material against the chassis and the supporting device to provide the air-tight seal therebetween. | ||
| 地址 | Singapore SG | ||