| 摘要 |
In a substrate liquid processing apparatus which can simultaneously supply a process solution of the same composition to both sides of a substrate and also collects and reuses the same after the supplied process solution is mixed, the effective operation of the apparatus can be secured. A substrate liquid processing apparatus includes: a first nozzle (304) which discharges a process solution stored in a first tank (102), a first process solution supply unit (100) which supplies a process solution to the first side of a substrate by the first nozzle, a second nozzle (306) which discharges a second tank (202) which stores a process solution of the same composition as the process solution stored in the first tank, a second process solution supply unit (200) which supplies a process solution to the second side of the substrate by the second nozzle, and a processing part (300) which processes the substrate with a process solution supplied by the first and the second nozzles. A process solution which is supplied from the first and the second nozzles and then is mixed, returns to the second tank through a collection line (312). |
