| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition apparatus which prevents stress concentration or film detachment at a boundary between a film-deposition part and a non-film-deposition part in coating a cutting tool with hard film, and shortens processing time.SOLUTION: A film deposition apparatus 101 which coats hard film 8a on a film-deposition part 71 at a tip end of a drill 70 (cutting tool) comprises: an induction heating coil 5; a cylinder 6; and a vapor phase processing part 2 which has an electrode 30 which opposes the drill 70 at a processing position, applies voltage between the electrode 30 and the drill 70 to generate plasma by created electric field, and performs plasma CVD. An opposing distance between the electrode 30 and the drill 70 at a processing position gradually reduces from a film-deposited part 71 to a non-film-deposited part 72, and is set to less than a minimum distance at which the hard film 8 can be formed in the non-film-deposition part 72. Because a step part is not formed on a boundary between the film-deposition part 71 and the non-film-deposition part 72, stress concentration and detachment of the film can be prevented. Further, since only a necessary portion is efficiently heated, processing time can be shortened. |
