发明名称 |
FLUID SUPPLY SYSTEM, EXPOSURE DEVICE, FLUID SUPPLY METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a fluid supply system capable of suppressing generation of an exposure failure.SOLUTION: A fluid supply system comprises: a first temperature adjustment device capable of adjusting temperature of first fluid; a second temperature adjustment device capable of adjusting temperature of second fluid; a heat exchanger capable of executing heat exchange between the first fluid supplied from the first temperature adjustment device and the second fluid supplied from the second temperature adjustment device; and a temperature sensor which detects temperature of first fluid passing through the heat exchanger to which the second fluid is being supplied and detects temperature of first fluid supplied from the first temperature adjustment device without passing through the heat exchanger. |
申请公布号 |
JP2015082594(A) |
申请公布日期 |
2015.04.27 |
申请号 |
JP20130220220 |
申请日期 |
2013.10.23 |
申请人 |
NIKON CORP |
发明人 |
MASUI HITOSHI;KANEKO KOJI;SERATA MAKI;HAYASHI AKIHITO |
分类号 |
H01L21/027;G02B19/00;G02B21/24 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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