| 摘要 |
PROBLEM TO BE SOLVED: To perform tie exposure without reducing throughput in a tying method for exposing a pattern image having the larger area than the size of a mask, even when tying is performed in the scanning direction.SOLUTION: A projection aligner includes: an exposure light shielding mechanism that gradually shields exposure light from illumination means; means for adjusting the exposure light reaching the surface of a plate by using the exposure light shielding mechanism; and means for performing exposure to an area immediately after the start or immediately before the completion of a shot on the plate while adjusting the exposure light, sequentially exposing shots adjacent in a non-scanning direction, moving to a diagonal shot of an exposure start shot, and then sequentially exposing the shots adjacent in the non-scanning direction in the same manner, so as to perform double exposure to a tying area. |
