| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of processing substrates in different sizes.SOLUTION: An exposure apparatus comprises: a chuck which is divided at least into two sheets, and suctions and fixes a substrate onto a stage; and pre-alignment sensors which perform pre-alignment at end faces of the substrate suctioned and fixed by the chuck. The exposure apparatus obtains a size of the substrate used for a job and a mounting position of the substrate on the chuck, as job information. At least one of the pre-alignment sensors is capable of stopping at any position within a groove region which is formed by the plurality of chucks arranged, as a measurement position. When a substrate smaller than the chuck is mounted, the pre-alignment sensor is capable of measuring an end face of the substrate at the measurement position. Since a suction area of the chuck is divided into a plurality of portions, it is possible to change the suction area and suction processing order in accordance with the job information. |
