发明名称 |
TRAP DEVICE AND SUBSTRATE TREATMENT APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a trap device which efficiently removes a reaction product contained in a gas flow.SOLUTION: A trap device comprises: a first cylindrical member having a space; a second cylindrical member being detachably disposed in the space and having an upstream side opening to flow a gas in and a downstream side opening to flow out the gas flowing in from the upstream side opening; a downstream side trap member disposed so as to close the downstream side opening at the inside of the second cylindrical member; and an upstream side trap member being disposed between the downstream side trap member and the upstream side opening of the second cylindrical member and having a recess recessing in a direction adjacent to the downstream side trap member. |
申请公布号 |
JP2015080738(A) |
申请公布日期 |
2015.04.27 |
申请号 |
JP20130218718 |
申请日期 |
2013.10.21 |
申请人 |
TOKYO ELECTRON LTD;TOHOKU SEIMITSU KK |
发明人 |
KOBAYASHI ATSUSHI;AKIYAMA SHINJI;ANDO SHUICHI;KOSUGE KAZUHIRO;YAMAMOTO TAKAHIRO |
分类号 |
B01D50/00;H01L21/205;H01L21/3065 |
主分类号 |
B01D50/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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