发明名称 TRAP DEVICE AND SUBSTRATE TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a trap device which efficiently removes a reaction product contained in a gas flow.SOLUTION: A trap device comprises: a first cylindrical member having a space; a second cylindrical member being detachably disposed in the space and having an upstream side opening to flow a gas in and a downstream side opening to flow out the gas flowing in from the upstream side opening; a downstream side trap member disposed so as to close the downstream side opening at the inside of the second cylindrical member; and an upstream side trap member being disposed between the downstream side trap member and the upstream side opening of the second cylindrical member and having a recess recessing in a direction adjacent to the downstream side trap member.
申请公布号 JP2015080738(A) 申请公布日期 2015.04.27
申请号 JP20130218718 申请日期 2013.10.21
申请人 TOKYO ELECTRON LTD;TOHOKU SEIMITSU KK 发明人 KOBAYASHI ATSUSHI;AKIYAMA SHINJI;ANDO SHUICHI;KOSUGE KAZUHIRO;YAMAMOTO TAKAHIRO
分类号 B01D50/00;H01L21/205;H01L21/3065 主分类号 B01D50/00
代理机构 代理人
主权项
地址