| 摘要 |
<p>PROBLEM TO BE SOLVED: To prevent movement of a substrate during inspection performed by probing both surfaces of the substrate with probe units respectively.SOLUTION: A substrate inspection device includes: movement mechanisms 3a and 3b which press contact plates of probe units 2a and 2b to move the probe units 2a and 2b toward a substrate 100 from the side of a lower surface 101a and the side of an upper surface 101b of the substrate 100 respectively; a processing unit 7 which executes control processing of controlling the movement mechanisms 3a and 3b; and a storage unit 6 in which coefficients of the probe units 2a and 2b obtained by dividing a resultant force of pressing force acting on the substrate 100 by movement amounts of the contact plates are stored. In the control processing, the processing unit 7 causes the movement mechanisms 3a and 3b to press the contact plates while adjusting movement amounts of respective contact plates so that a ratio of the movement amount of the contact plate of the probe unit 2a to the movement amount of the contact plate of the probe unit 2b is equalized to a ratio of the reciprocal of the coefficient of the probe unit 2a to the reciprocal of the coefficient of the probe unit 2b.</p> |
