SPUTTERING TARGET AND METHOD FOR MANUFACTURING SPUTTERING TARGET

摘要

PROBLEM TO BE SOLVED: To provide a sputtering target that does not need an extra-manufacturing facility and is excellent in post-sputtering property, and to provide a method for manufacturing the same.SOLUTION: The sputtering target is integrally formed from a plurality of parts that are divided into small pieces of single metal to be a target material by hot isostatic press (HIP) and diffused junction. There is also provided the method for manufacturing the sputtering target.