| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming method by which various types of patterns can be easily formed, and a method for manufacturing an electronic device, and an electronic device.SOLUTION: The pattern forming method includes steps of, in the following order: (1) forming a film in which polarity is increased by irradiation with actinic rays or radiation; (2) subjecting the film to first pattern exposure to form a high exposure part, a medium exposure part, and a low exposure part; (3) developing the film subjected to the first pattern exposure by using one of (i) a first developer that can dissolve the high exposure part of the film and (ii) a second developer that can dissolve the low exposure part of the film, to form a first pattern; (4) subjecting the first pattern to second pattern exposure with an optical image different from that of the first pattern exposure; and (5) developing the first pattern by using the other developer of the first developer and the second developer to form a second pattern. The present invention also discloses a method for manufacturing an electronic device using the above pattern forming method, and an electronic device manufactured by the method. |
