| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus which suppresses deterioration in throughput by TTL measurement to the minimum.SOLUTION: The exposure apparatus has measuring means 15 that measures, through a projection optical system 5, a relative positional relation between an original plate stage 3 and a substrate stage 7 using a plurality of original-plate-side fiducial mark plates 11 arranged in the original plate stage 3 and a plurality of substrate-side fiducial mark plates 13 arranged in the substrate stage 7. The exposure apparatus comprises a driving section 32 for driving the substrate-side fiducial mark plates 13 arranged in the substrate stage 7 and a measuring section 21 for measuring an environmental load by change in each fiducial mark plate and ambient temperatures. The exposure apparatus further has means for correcting positional displacement amounts due to the environmental load of each fiducial mark plate, using the driving section 13 and the measuring section 21, so that relative positional relations between the plurality of original-plate-side fiducial mark plates 11 and the substrate-side fiducial mark plates 13 can be measured at the same time. |
