发明名称 CATHODE FOR PLASMA CHAMBER
摘要 Disclosed is a cathode electrode plate for a plasma chamber. The cathode electrode plate for the plasma chamber according to one embodiment of the present invention adheres to a cooling plate of the plasma chamber, and is the cathode electrode plate in which multiple combining grooves are formed along a circumferential direction. The cathode electrode plate comprises: an equally-spaced section in which the combing grooves are disposed at equally spaced intervals, an unequally-spaced sections in which the combining grooves are disposed at unequally spaced intervals adjacent to the equally-spaced section, and a hole and a gas barrel having a plurality of concentric circles on the basis of the center, wherein the plurality of concentric circles is opened.
申请公布号 KR101514429(B1) 申请公布日期 2015.04.24
申请号 KR20130139274 申请日期 2013.11.15
申请人 HANA SILICON, INC. 发明人 PARK, JIN KYOUNG;KIM, YONG UK
分类号 H05H1/34 主分类号 H05H1/34
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