| 发明名称 |
OXYGEN CONTAINING PLASMA CLEANING TO REMOVE CONTAMINATION FROM ELECTRONIC DEVICE COMPONENTS |
| 摘要 |
A gas comprising oxygen is supplied to a plasma source. A plasma jet comprising oxygen plasma particles is generated from the gas. A contaminant is removed from the component using the oxygen plasma particles. |
| 申请公布号 |
US2015107618(A1) |
申请公布日期 |
2015.04.23 |
| 申请号 |
US201314059405 |
申请日期 |
2013.10.21 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
Sun Jennifer Y.;Firouzdor Vahid;Cho Tom K.;Zhang Ying |
| 分类号 |
H01J37/32;B08B7/00 |
主分类号 |
H01J37/32 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method to clean a component of an electronic device manufacturing equipment comprising:
supplying a gas comprising oxygen to a plasma source; generating a plasma jet comprising oxygen plasma particles from the gas; and removing a contaminant from the component using the oxygen plasma particles. |
| 地址 |
Santa Clara CA US |
