| 摘要 |
Provided is a simple method for forming a pattern of a polyimide, which enables a more excellent processed shape and more excellent dimensional accuracy of the processed shape in comparison to conventional polyimide processing techniques such as photolithography and laser processing. During the formation of a fine pattern of a polyimide, a solvent-soluble polyimide resin composition, which is photosensitive and can be molded at a temperature that is not more than the glass transition temperature, is used as the polyimide, and the polyimide resin composition is patterned by thermal imprinting and then thermally cured. Subsequent to the mold release after the molding step in the above-described method, ultraviolet light irradiation is carried out. |
