发明名称 |
VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK PREFORM, METHOD OF PRODUCING VAPOR DEPOSITION MASK AND METHOD OF PRODUCING ORGANIC SEMICONDUCTOR ELEMENT |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a vapor deposition mask which can achieve both high definition and weight saving even when being large-sized and enables formation of a high-definition vapor deposition pattern while keeping strength, a vapor deposition mask preform allowing easy production of the vapor deposition mask, a method of producing a vapor deposition mask and a method of producing an organic semiconductor element which enables production of a high-definition organic semiconductor element.SOLUTION: In a vapor deposition mask, a metal mask 10 provided with a silt 15 and a resin mask 20 in which an opening 25 corresponding to a pattern to be formed by vapor deposition is provided at a position superimposed on the slit 15 are laminated together, and the metal mask 10 has a general region 10a provided with the slit 15 and a thick region 10b thicker than the general region.</p> |
申请公布号 |
JP2015078441(A) |
申请公布日期 |
2015.04.23 |
申请号 |
JP20140240433 |
申请日期 |
2014.11.27 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
OBATA KATSUYA;TAKEDA TOSHIHIKO;KAWASAKI HIROSHI;NISHIMURA SUKEYUKI;MAKI JUN;OCHIAI HIROMITSU;HIROBE YOSHINORI |
分类号 |
C23C14/04;H01L51/50;H05B33/10 |
主分类号 |
C23C14/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|