发明名称 VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK PREFORM, METHOD OF PRODUCING VAPOR DEPOSITION MASK AND METHOD OF PRODUCING ORGANIC SEMICONDUCTOR ELEMENT
摘要 <p>PROBLEM TO BE SOLVED: To provide a vapor deposition mask which can achieve both high definition and weight saving even when being large-sized and enables formation of a high-definition vapor deposition pattern while keeping strength, a vapor deposition mask preform allowing easy production of the vapor deposition mask, a method of producing a vapor deposition mask and a method of producing an organic semiconductor element which enables production of a high-definition organic semiconductor element.SOLUTION: In a vapor deposition mask, a metal mask 10 provided with a silt 15 and a resin mask 20 in which an opening 25 corresponding to a pattern to be formed by vapor deposition is provided at a position superimposed on the slit 15 are laminated together, and the metal mask 10 has a general region 10a provided with the slit 15 and a thick region 10b thicker than the general region.</p>
申请公布号 JP2015078441(A) 申请公布日期 2015.04.23
申请号 JP20140240433 申请日期 2014.11.27
申请人 DAINIPPON PRINTING CO LTD 发明人 OBATA KATSUYA;TAKEDA TOSHIHIKO;KAWASAKI HIROSHI;NISHIMURA SUKEYUKI;MAKI JUN;OCHIAI HIROMITSU;HIROBE YOSHINORI
分类号 C23C14/04;H01L51/50;H05B33/10 主分类号 C23C14/04
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