TRANSFER METHOD AND THERMAL NANOIMPRINTING APPARATUS

摘要

A first mask layer (13) and a second mask layer (12) are transferred and imparted to a target object (20) using a fine-pattern-forming film (I) provided with a cover film (10) having a nanoscale concavo-convex structure (11) formed on one surface thereof, a second mask layer (12) provided in a recess of the concavo-convex structure (11), and a first mask layer (13) provided so as to cover the concavo-convex structure (11) and the second mask layer (12). A surface of a fine-pattern-forming film (II) to which the first mask layer (13) is provided is pressed toward a surface of the target object (20), energy rays are irradiated to the first mask layer (13), and the cover film (10) is then separated from the second mask layer (12) and the first mask layer (13). Pressing and energy ray irradiation are each performed independently. The target object is etched using the second mask layer (12) and the first mask layer (13).

主权项

1. A transfer method for transferring a first mask layer and a second mask layer on a target object using a fine-pattern-forming film provided with a cover film having a nanoscale concavo-convex structure formed on one surface thereof, a second mask layer provided in a recess of said concavo-convex structure, and a first mask layer provided so as to cover said concavo-convex structure and said second mask layer;
said transfer method characterized in including, at least in the stated order: a pressing step for pressing a surface of said fine-pattern-forming film on which said first mask layer is provided toward a surface of said target object; an energy-ray irradiation step for irradiating energy rays to said first mask layer; and a release step for removing said cover film from said second mask layer and said first mask layer; said pressing step and said energy-ray irradiation step each being performed independently.