| 主权项 |
1. A sputtering apparatus comprising:
a target holder including a target mounting surface; and a magnet unit of a rectangular shape disposed near an opposite surface of the target holder from the target mounting surface, and having a long side and a short side, wherein the magnet unit includes:
a first magnet magnetized in a direction perpendicular to the target mounting surface,a second magnet disposed surrounding the first magnet and magnetized in the direction perpendicular to the target mounting surface and in a different and opposite direction from the direction of magnetization of the first magnet, anda third magnet located at part between the first magnet and the second magnet in the short-side direction and at least at a center position between the first magnet and the second magnet, the third magnet being magnetized in the short-side direction, wherein the third magnet includes:
a surface facing the second magnet and having the same polarity as a polarity of a surface of the second magnet on the target holder side, anda surface facing the first magnet and having the same polarity as a polarity of a surface of the first magnet on the target holder side, and wherein an end portion in the long-side direction between the first magnet and the second magnet is not provided with the third magnet. |
