发明名称 APPARATUS AND METHOD FOR MANUFACTURING SiO
摘要 Disclosed is an apparatus and method for manufacturing SiO, which may lower a manufacturing cost of SiO by collecting SiO continuously. The apparatus for manufacturing SiO includes a reaction unit configured to receive a SiO-making material and bring the received material into reaction by heating to generate a SiO gas; and a collecting unit configured to maintain an internal temperature lower than an internal temperature of the reaction unit, the collecting unit including a rotating member in an inner space thereof, wherein the collecting unit collects a SiO deposit by introducing the SiO gas generated by the reaction unit through an inlet formed at least at one side thereof and allowing the introduced SiO gas to be deposited to a surface of the rotating member.
申请公布号 US2015110699(A1) 申请公布日期 2015.04.23
申请号 US201414587848 申请日期 2014.12.31
申请人 LG Chem, Ltd. 发明人 JUNG Sang-Yun;JEONG Han-Nah;PARK Cheol-Hee;PARK Chee-Sung;KIM Jae-Hyun
分类号 C01B33/113 主分类号 C01B33/113
代理机构 代理人
主权项 1. An apparatus for manufacturing SiO, comprising: a reaction unit configured to receive a SiO-making material and bring the received material into reaction by heating to generate a SiO gas; and a collecting unit configured to maintain an internal temperature lower than an internal temperature of the reaction unit, the collecting unit including a rotating member in an inner space thereof, wherein the collecting unit collects a SiO deposit by introducing the SiO gas generated by the reaction unit through an inlet formed at least at one side thereof and allowing the introduced SiO gas to be deposited to a surface of the rotating member.
地址 Seoul KR