| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface pattern defect measuring apparatus of a transparent substrate.SOLUTION: The present invention relates to a surface pattern defect measuring apparatus of a transparent substrate. A material having low reflectance is patterned on the transparent substrate. Even when the difference between the reflectance of the transparent substrate and that of the patterned material is not large, the reflectance of the transparent substrate is made to approach zero to relatively increase the reflectance of the patterned material, the reflectance ratio between the patterned material and transparent substrate is increased, and the surface pattern having increased detection accuracy is measured or the presence/absence of a pattern defect is measured. |
