发明名称 |
TRAP APPARATUS AND SUBSTRATE PROCESSING APPARATUS |
摘要 |
A trap apparatus includes: a first cylindrical member including a space; a second cylindrical member removably disposed in the space and including side opening which allows a gas stream to flow in therethrough, and a downstream side opening which allows the gas stream flowing in from the upstream side opening to flow out therethrough; a downstream side trap member which is disposed inside the second cylindrical member to block the downstream side opening; and an upstream side trap member which is disposed between the downstream side trap member and the upstream side opening of the second cylindrical member and includes a concave portion recessed in a direction approaching the downstream side trap member. |
申请公布号 |
US2015107771(A1) |
申请公布日期 |
2015.04.23 |
申请号 |
US201414518079 |
申请日期 |
2014.10.20 |
申请人 |
TOKYO ELECTRON LIMITED ;TOHOKU SEIMITSU CO., LTD. |
发明人 |
KOBAYASHI Atsushi;AKIYAMA Shinji;ANDOU Shuuichi;KOSUGA Katsuhiro;YAMAMOTO Takahiro |
分类号 |
H01J37/32;B01D46/00;C23C16/44 |
主分类号 |
H01J37/32 |
代理机构 |
|
代理人 |
|
主权项 |
1. A trap apparatus comprising:
a first cylindrical member including a space; a second cylindrical member removably disposed in the space and including an upstream side opening which allows a gas stream to flow in therethrough, and a downstream side opening which allows the gas stream flowing in from the upstream side opening to flow out therethrough; a downstream side trap member which is disposed inside the second cylindrical member to block the downstream side opening; and an upstream side trap member which is disposed between the downstream side trap member and the upstream side opening of the second cylindrical member and includes a concave portion recessed in a direction approaching the downstream side trap member. |
地址 |
Tokyo JP |