发明名称 TRAP APPARATUS AND SUBSTRATE PROCESSING APPARATUS
摘要 A trap apparatus includes: a first cylindrical member including a space; a second cylindrical member removably disposed in the space and including side opening which allows a gas stream to flow in therethrough, and a downstream side opening which allows the gas stream flowing in from the upstream side opening to flow out therethrough; a downstream side trap member which is disposed inside the second cylindrical member to block the downstream side opening; and an upstream side trap member which is disposed between the downstream side trap member and the upstream side opening of the second cylindrical member and includes a concave portion recessed in a direction approaching the downstream side trap member.
申请公布号 US2015107771(A1) 申请公布日期 2015.04.23
申请号 US201414518079 申请日期 2014.10.20
申请人 TOKYO ELECTRON LIMITED ;TOHOKU SEIMITSU CO., LTD. 发明人 KOBAYASHI Atsushi;AKIYAMA Shinji;ANDOU Shuuichi;KOSUGA Katsuhiro;YAMAMOTO Takahiro
分类号 H01J37/32;B01D46/00;C23C16/44 主分类号 H01J37/32
代理机构 代理人
主权项 1. A trap apparatus comprising: a first cylindrical member including a space; a second cylindrical member removably disposed in the space and including an upstream side opening which allows a gas stream to flow in therethrough, and a downstream side opening which allows the gas stream flowing in from the upstream side opening to flow out therethrough; a downstream side trap member which is disposed inside the second cylindrical member to block the downstream side opening; and an upstream side trap member which is disposed between the downstream side trap member and the upstream side opening of the second cylindrical member and includes a concave portion recessed in a direction approaching the downstream side trap member.
地址 Tokyo JP