发明名称 |
SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device which includes a MOSFET part and a protection diode part causing avalanche breakdown at a voltage lower than that in the MOSFET part on the same semiconductor substrate, and though having high avalanche resistance, achieves high overvoltage breakdown resistance and high switching speed.SOLUTION: A semiconductor device 100 comprises: a MOSFET part 40 which has first protection trenches 132 each formed deeper than a gate trench 118 and ptype first semiconductor regions 134 each formed on a bottom of the first protection trench 132; and a protection diode part 50 which has second protection trenches 132a each formed deeper than the gate trench 118 and ptype second semiconductor regions 134a each formed on a bottom of the second protection trench 132a. A distance L4 between the neighboring second protection trenches 132a is larger than a distance L3 between the neighboring first protection trenches 132. |
申请公布号 |
JP2015079894(A) |
申请公布日期 |
2015.04.23 |
申请号 |
JP20130216860 |
申请日期 |
2013.10.17 |
申请人 |
SHINDENGEN ELECTRIC MFG CO LTD |
发明人 |
SUGAI AKIHIKO;NAKAMURA SHUNICHI;INOUE TETSUHITO;SENDA SATORU |
分类号 |
H01L27/04;H01L21/28;H01L21/336;H01L29/12;H01L29/47;H01L29/78;H01L29/872 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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