发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To achieve a semiconductor device which forms a structure as represented by a gate electrode in a comparatively simple constitution and has high reliability.SOLUTION: A semiconductor device comprises a compound semiconductor layer 2, a gate electrode 8 formed on the compound semiconductor layer 2, a source electrode 4 and a drain electrode 5 which are formed on the compound semiconductor layer 2 and on both sides of the gate electrode 8, and a pair of projections 7a, 7b which are formed above the compound semiconductor layer 2 and on both sides of the gate electrode 8.</p>
申请公布号 JP2015079800(A) 申请公布日期 2015.04.23
申请号 JP20130215050 申请日期 2013.10.15
申请人 FUJITSU LTD 发明人 MAKIYAMA KOZO
分类号 H01L21/338;H01L21/28;H01L21/336;H01L29/41;H01L29/778;H01L29/78;H01L29/812 主分类号 H01L21/338
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