GAS SUPPLY DEVICE AND SUBSTRATE PROCESSING APPARATUS

摘要

A shower head 13 (gas supply device) of supplying a processing gas and an additional gas from a processing gas supply source and an additional gas source, respectively, into a processing space S includes multiple gas distribution plates 28 to 31, the cooling plate 32, and the cover plate 33 stacked in sequence. A peripheral gas diffusion space 35 and an outermost gas diffusion space 36 are formed in the undermost gas distribution plate 28. At least one gas supply path for supplying the processing gas and additional gas into any one of the peripheral gas diffusion space and the outermost gas diffusion space is formed at each of the gas distribution plates. The gas supply path is branched into multiple lines and distances from the processing gas supply source to front ends of the respective branch lines are set to be all the same.

主权项

1. A gas supply device of supplying a gas into a processing space from a gas supply source, the gas supply device comprising:
a facing plate that faces the processing space and includes multiple through holes; multiple gas distribution plates; and a cover plate, wherein the facing plate, the gas distribution plates, and the cover plate are stacked in sequence, in a surface, which faces the facing plate, of the gas distribution plate closest to the facing plate, multiple gas diffusion spaces are formed, in each of the gas distribution plates, at least one gas supply path through which the gas is supplied into any one of the gas diffusion spaces from the gas supply source is formed, and in each of the gas distribution plates, the at least one gas supply path is branched into multiple branch lines and distances from the gas supply source to front ends of the respective branch lines are all the same.