| 发明名称 |
PLASMA GENERATION APPARATUS, DEPOSITION APPARATUS, AND PLASMA GENERATION METHOD |
| 摘要 |
Provided is a plasma generation apparatus capable of generating uniform plasma over a wide range. The plasma generation apparatus includes two oppositely arranged plasma guns each injecting a discharge gas to be ionized, and having a cathode for emitting electrons, and a converging coil for forming a magnetic flux to guide the emitted electrons, and polarities of the converging coils with respect to the cathodes in the two plasma guns are opposite to each other. |
| 申请公布号 |
US2015107987(A1) |
申请公布日期 |
2015.04.23 |
| 申请号 |
US201314391499 |
申请日期 |
2013.02.27 |
| 申请人 |
CHUGAI RO CO., LTD. |
发明人 |
Furuya Eiji |
| 分类号 |
H01J37/34;C23C14/35 |
主分类号 |
H01J37/34 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A plasma generation apparatus comprising two oppositely arranged plasma guns each injecting a discharge gas to be ionized and having a cathode for emitting electrons, and a converging coil for forming a magnetic flux to guide the emitted electrons, wherein
polarities of the converging coils with respect to the cathodes in the two plasma guns are opposite to each other. |
| 地址 |
Osaka-shi, Osaka JP |
