发明名称 CHEMICAL MECHANICAL POLISHER WITH HUB ARMS MOUNTED
摘要 <p>A chemical mechanical polishing system is provided. The chemical mechanical polishing system includes a platen, a load cup, a hub, a first polishing arm cantilevered from the hub and rotatable around the centerline of the hub between the platen and load cup, and a second polishing arm cantilevered from the hub and rotatable around the centerline of the hub between the platen and load cup the second arm rotatable independently from the hub.</p>
申请公布号 WO2015057447(A1) 申请公布日期 2015.04.23
申请号 WO2014US59653 申请日期 2014.10.08
申请人 APPLIED MATERIALS, INC. 发明人 ZUNIGA, STEVEN, M.;CHEN, HUNG, CHIH;GURUSAMY, JAY
分类号 H01L21/304 主分类号 H01L21/304
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