发明名称 |
CHEMICAL MECHANICAL POLISHER WITH HUB ARMS MOUNTED |
摘要 |
<p>A chemical mechanical polishing system is provided. The chemical mechanical polishing system includes a platen, a load cup, a hub, a first polishing arm cantilevered from the hub and rotatable around the centerline of the hub between the platen and load cup, and a second polishing arm cantilevered from the hub and rotatable around the centerline of the hub between the platen and load cup the second arm rotatable independently from the hub.</p> |
申请公布号 |
WO2015057447(A1) |
申请公布日期 |
2015.04.23 |
申请号 |
WO2014US59653 |
申请日期 |
2014.10.08 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
ZUNIGA, STEVEN, M.;CHEN, HUNG, CHIH;GURUSAMY, JAY |
分类号 |
H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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