发明名称 |
RESISTIVE RANDOM ACCESS MOMORY COMPRISING MULTI STACKED STRUCTURE, AND METHOD FOR FABRICATING THE SAME |
摘要 |
<p>The present invention relates to a resistive random access memory comprising a memory layer of a stacked structure, and a method for fabricating the same. A resistive random access memory according to an embodiment of the present invention includes a first electrode; a memory layer formed on the first electrode; and a second electrode formed on the memory layer. The memory layer includes a first memory layer and a second memory layer. The oxygen content of the first memory layer is different from that of the second memory layer.</p> |
申请公布号 |
KR101512728(B1) |
申请公布日期 |
2015.04.23 |
申请号 |
KR20140120810 |
申请日期 |
2014.09.12 |
申请人 |
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY |
发明人 |
KIM, HYUN JAE;PARK, SUNG PYO;YOON, DOO HYUN;TAK, YOUNG JUN;LEE, HEE SOO |
分类号 |
H01L27/115;H01L21/8247;H01L29/02 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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