发明名称 HIGH ELECTRON MOBILITY TRANSISTOR
摘要 According to example embodiments, a high electron mobility transistor (HEMT) includes a channel layer having a 2-dimensional electron gas (2DEG), a channel supply layer on the channel layer, a source electrode and a drain electrode spaced apart from each other on one of the channel layer and the channel supply layer, at least one channel depletion layer on the channel supply layer; a gate electrode on at least a part of the channel depletion layer, and at least one bridge connecting the channel depletion layer and the source electrode. The channel depletion layer is configured to form a depletion region in the 2DEG. The HEMT has a ratio of a first impedance to a second impedance that is a uniform value. The first impedance is between the gate electrode and the channel depletion layer. The second impedance is between the source electrode and the channel depletion layer.
申请公布号 US2015108547(A1) 申请公布日期 2015.04.23
申请号 US201414330072 申请日期 2014.07.14
申请人 Samsung Electronics Co., Ltd. 发明人 HWANG In-jun
分类号 H01L29/778 主分类号 H01L29/778
代理机构 代理人
主权项 1. A high electron mobility transistor (HEMT) comprising: a channel layer having a 2-dimensional electron gas (2DEG); a channel supply layer on the channel layer; a source electrode and a drain electrode spaced apart from each other on one of the channel layer and the channel supply layer; a channel depletion layer on the channel supply layer, the channel depletion layer configured to form a depletion region in the 2DEG; a gate electrode on at least a part of the channel depletion layer; and at least one bridge connecting the channel depletion layer to the source electrode, the HEMT having a ratio of a first impedance to a second impedance being a uniform value, the first impedance being between the gate electrode and the channel depletion layer, the second impedance being between the source electrode and the channel depletion layer.
地址 Suwon-Si KR