发明名称 |
HIGH ELECTRON MOBILITY TRANSISTOR |
摘要 |
According to example embodiments, a high electron mobility transistor (HEMT) includes a channel layer having a 2-dimensional electron gas (2DEG), a channel supply layer on the channel layer, a source electrode and a drain electrode spaced apart from each other on one of the channel layer and the channel supply layer, at least one channel depletion layer on the channel supply layer; a gate electrode on at least a part of the channel depletion layer, and at least one bridge connecting the channel depletion layer and the source electrode. The channel depletion layer is configured to form a depletion region in the 2DEG. The HEMT has a ratio of a first impedance to a second impedance that is a uniform value. The first impedance is between the gate electrode and the channel depletion layer. The second impedance is between the source electrode and the channel depletion layer. |
申请公布号 |
US2015108547(A1) |
申请公布日期 |
2015.04.23 |
申请号 |
US201414330072 |
申请日期 |
2014.07.14 |
申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
HWANG In-jun |
分类号 |
H01L29/778 |
主分类号 |
H01L29/778 |
代理机构 |
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代理人 |
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主权项 |
1. A high electron mobility transistor (HEMT) comprising:
a channel layer having a 2-dimensional electron gas (2DEG); a channel supply layer on the channel layer; a source electrode and a drain electrode spaced apart from each other on one of the channel layer and the channel supply layer; a channel depletion layer on the channel supply layer, the channel depletion layer configured to form a depletion region in the 2DEG; a gate electrode on at least a part of the channel depletion layer; and at least one bridge connecting the channel depletion layer to the source electrode, the HEMT having a ratio of a first impedance to a second impedance being a uniform value, the first impedance being between the gate electrode and the channel depletion layer, the second impedance being between the source electrode and the channel depletion layer. |
地址 |
Suwon-Si KR |