发明名称 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE
摘要 A nonvolatile semiconductor memory device includes first and second word line groups, each including a plurality of stacked word lines above a substrate, a first memory string including a first memory column through the first word line group, a second memory column through the second word line group, and a first memory connection portion electrically coupling the first and second memory columns, and a second memory string including a third memory column through the first word line group, a fourth memory column through the second word line group, and a second memory connection portion electrically coupling the third and fourth memory columns. The first memory connection portion is formed in a first layer of the substrate and the second memory connection portion is formed in a second layer of the substrate that is lower than the first layer.
申请公布号 US2015109862(A1) 申请公布日期 2015.04.23
申请号 US201414474305 申请日期 2014.09.02
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SHIBATA Noboru;SUKEGAWA Hiroshi
分类号 H01L27/115;G11C16/26;G11C5/06 主分类号 H01L27/115
代理机构 代理人
主权项 1. A nonvolatile semiconductor memory device comprising: first and second word line groups, each including a plurality of stacked word lines above a substrate; a first memory string including a first memory column through the first word line group, a second memory column through the second word line group, and a first memory connection portion electrically coupling the first and second memory columns; and a second memory string including a third memory column through the first word line group, a fourth memory column through the second word line group, and a second memory connection portion electrically coupling the third and fourth memory columns, wherein the first memory connection portion is formed in a first layer of the substrate and the second memory connection portion is formed in a second layer of the substrate that is lower than the first layer.
地址 Tokyo JP