发明名称 |
NONVOLATILE SEMICONDUCTOR MEMORY DEVICE |
摘要 |
A nonvolatile semiconductor memory device includes first and second word line groups, each including a plurality of stacked word lines above a substrate, a first memory string including a first memory column through the first word line group, a second memory column through the second word line group, and a first memory connection portion electrically coupling the first and second memory columns, and a second memory string including a third memory column through the first word line group, a fourth memory column through the second word line group, and a second memory connection portion electrically coupling the third and fourth memory columns. The first memory connection portion is formed in a first layer of the substrate and the second memory connection portion is formed in a second layer of the substrate that is lower than the first layer. |
申请公布号 |
US2015109862(A1) |
申请公布日期 |
2015.04.23 |
申请号 |
US201414474305 |
申请日期 |
2014.09.02 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
SHIBATA Noboru;SUKEGAWA Hiroshi |
分类号 |
H01L27/115;G11C16/26;G11C5/06 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
1. A nonvolatile semiconductor memory device comprising:
first and second word line groups, each including a plurality of stacked word lines above a substrate; a first memory string including a first memory column through the first word line group, a second memory column through the second word line group, and a first memory connection portion electrically coupling the first and second memory columns; and a second memory string including a third memory column through the first word line group, a fourth memory column through the second word line group, and a second memory connection portion electrically coupling the third and fourth memory columns, wherein the first memory connection portion is formed in a first layer of the substrate and the second memory connection portion is formed in a second layer of the substrate that is lower than the first layer. |
地址 |
Tokyo JP |