| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing device that has a shower plate for introducing gas into a processing container and that generates surface wave plasma by means of a microwave, the plasma processing device being designed to prevent film formation in a gas hole of the shower plate and to efficiently generate plasma.SOLUTION: A plasma processing device including a processing container 10, in which plasma processing is performed, and a shower plate 100, which supplies gas into the processing container 10, has a suspending member 101 projecting downward from the lower end face of the shower plate 100. The external face of the suspending member 101 spreads out from its upper end part to its lower end part. The shower plate 100 includes a plurality of first supply ports 133, which supply first gas into the processing container 10, and a plurality of second support ports 151, which supply second gas. The first gas supply ports 133 are arranged inside the external face of the suspending member 101. The second gas supply ports 151 are arranged outside the external face of the suspending member. |
