| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a salt of an acid generator for a resist composition capable of obtaining patterns having excellent line edge roughness. <P>SOLUTION: The salt is represented by formula (I) [wherein, Q<SP>1</SP>and Q<SP>2</SP>are each fluorine atom or 1-6C perfluoroalkyl; n is an integer of 1-3; and Z<SP>+</SP>is sulfonium cation represented by formula (b2-1) or the like, or diphenyliodonium cation]. <P>COPYRIGHT: (C)2011,JPO&INPIT |
