发明名称 Method and apparatus of growing metal-free and low stress thick film of diamond-like carbon
摘要 <p>The presently claimed invention provides a metal-free and low stress thick film of diamond-like carbon (DLC). The diamond-like carbon layer of the present invention has a wide range of applications such as automotive coating, hydrophobic-hydrophilic tuning, solar photovoltaic, decorative coating, protective coating and bio-compatible coating. The presently claimed invention further provides a method and an apparatus to grow a metal-free and low stress thick film of diamond-like carbon by performing deposition and plasma etching to stack more than one diamond-like carbon layers together in the same chamber.</p>
申请公布号 EP2862955(A1) 申请公布日期 2015.04.22
申请号 EP20140188154 申请日期 2014.10.08
申请人 NANO AND ADVANCED MATERIALS INSTITUTE LIMITED 发明人 WANG, ZHONGHUI ALEX
分类号 C23C16/02;C23C16/26;C23C16/56;C23C28/04 主分类号 C23C16/02
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