| 摘要 |
<p>Disclosed is a method for manufacturing an array-type optical detector, which is capable of reducing optical crosstalk. The method for manufacturing the array-type optical detector comprises the steps of: preparing a doped substrate; growing a non-conductive layer on one surface of the doped substrate; growing an optical-detector-array manufacturing layer on the non-conductive layer; etching the optical-detector-array manufacturing layer to manufacture the optical detector, the etching being performed on a portion of the non-conductive layer; forming an etching mask on the other surface of the doped substrate; and forming an aperture array functioning as a horn antenna on the other surface of the doped substrate by etching the other surface of the doped substrate through the etching mask.</p> |
