| 摘要 |
<p>An exposure condition processing method for an X-ray CT apparatus according to the embodiment includes: a step in which a first X-ray emitting condition and a second X-ray emitting condition for the X-ray CT apparatus are input to a processor; a step in which the processor, based on the first X-ray emitting condition and the second X-ray emitting condition, acquires interval times for switching the first X-ray scanning with the first X-ray emitting condition, and the second X-ray scanning with the second X-ray emitting condition; a step in which the processor, based on the rotation speed of a gantry in the X-ray CT apparatus that is previously stored in a memory and the interval times, calculates the frequency of intermittent emission of an X-ray, with respect to the rotation speed of the gantry.</p> |
