发明名称 LIMITING MIGRATION OF TARGET MATERIAL
摘要 In an electron irradiation system, a gas-tight housing encloses a cathode region and an irradiation region, which communicate through at least an aperture. In the cathode region, there is arranged a high-voltage cathode for emitting an electron beam. In the irradiation region, there is an irradiation site arranged to accommodate a stationary or moving object to be irradiated. The migration of cathode-degrading debris is limited by means of an electric field designed to prevent positively charged particles from entering the cathode region via the aperture. The invention can be embodied with an axial electric field, which realizes an energy threshold, or a transversal field which deflects charged particles away from trajectories leading into the cathode region.
申请公布号 EP2862182(A1) 申请公布日期 2015.04.22
申请号 EP20120730852 申请日期 2012.06.14
申请人 EXCILLUM AB 发明人 HEMBERG, OSCAR;TUOHIMAA, TOMI;TAKMAN, PER
分类号 G21K5/04;H01J35/04 主分类号 G21K5/04
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