发明名称 |
PHOTOCURABLE COMPOSITION, BARRIER LAYER INCLUDING SAME, AND ENCAPSULATED DEVICE INCLUDING SAME |
摘要 |
The present invention relates to a photocurable composition, to a barrier layer including same, and to an encapsulated device including same, wherein the composition comprises a photocurable monomer(A) and a silicon containing monomer(B), wherein the silicon containing monomers(B) has a structure according to Formula 1. |
申请公布号 |
EP2863261(A1) |
申请公布日期 |
2015.04.22 |
申请号 |
EP20130804640 |
申请日期 |
2013.02.22 |
申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
LEE, CHANG MIN;CHOI, SEUNG JIB;KWON, JI HYE;LEE, YEON SOO;HA, KYOUNG JIN |
分类号 |
G03F7/075;G03F7/028;H01L51/50 |
主分类号 |
G03F7/075 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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