发明名称 PHOTOCURABLE COMPOSITION, BARRIER LAYER INCLUDING SAME, AND ENCAPSULATED DEVICE INCLUDING SAME
摘要 The present invention relates to a photocurable composition, to a barrier layer including same, and to an encapsulated device including same, wherein the composition comprises a photocurable monomer(A) and a silicon containing monomer(B), wherein the silicon containing monomers(B) has a structure according to Formula 1.
申请公布号 EP2863261(A1) 申请公布日期 2015.04.22
申请号 EP20130804640 申请日期 2013.02.22
申请人 CHEIL INDUSTRIES INC. 发明人 LEE, CHANG MIN;CHOI, SEUNG JIB;KWON, JI HYE;LEE, YEON SOO;HA, KYOUNG JIN
分类号 G03F7/075;G03F7/028;H01L51/50 主分类号 G03F7/075
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